μPG101是一款经济实惠且易于操作的图形发生器，适用于直写和少批量的掩模板制作。该系统可用于MEMS、BioMEMS、Integrated Optics、Micro Fluidics或任何其他需要高精度、高分辨率微结构的制作。
μPG101的面积仅为60x75cm²，设计精巧，将所有电子组件集成在系统中，由系统控制主机运作。基于Windows®的控制接口，使用户可以轻松进行数据转文件，经过手动或自动对准之后，即可开始曝光。
μPG101主要提供简单快速的方式来创建微结构。系统可透读写模块的更换，以满足不用的分辨率和写入速度的要求。它是市面上唯一达到亚微米结构的桌上型光刻系统，是偏小网格，依然具有非常高精度的结构。实时自动对焦系统可在曝光期间实时监控和校正聚焦位置，从而确保整个曝光区域的高分辨率和可重复性。精密网格和实时自动对焦装置是专业微图型发生器的标准要求。
MLA100的应用包括Life Science, MEMS, Micro-Optics, Semiconductor,Sensors, Actuators, MOEMS, Material Research, Nano-Tubes,Graphene以及任何其他需要微结构的应用。
Designed with focus on high performance at an affordable price,the MLA100 is the perfect lithography solution for many R&Dapplications. The optical system is designed to write structuresdown to 1 μm at a speed of 50 mm²/min directly into photoresist,without the need for a photomask. The elimination of photomasksfrom the lithographic process will increase the flexibility andsignificantly shorten the prototyping or manufacturing cycle. TheMLA100 is controlled by an exposure wizard (GUI), which guides theoperator through the complete procedure: Load the substrate, selectthe design and start the exposure. With a footprint of 60x75cm² theMLA100 was designed to fit even into the smallest R&Dlaboratories, and requires only power and compressed air foroperation.
Applications for the MLA100 include Life Science, MEMS,Micro-Optics, Semiconductor, Sensors, Actuators, MOEMS, MaterialResearch, Nano-Tubes, Graphene, and any other application thatrequires microstructures.
